psiloQuest Introduces New CMP Polishing Pad
ORLANDO, Fla. – (BUSINESS WIRE) – Jan. 17, 2006 – psiloQuest, Inc. is pleased to announce the commercial launch of the W ProPad™ CMP polishing pad specifically developed for the most demanding tungsten CMP applications. W ProPad™ is the first commercially released product in the ProPad™ family of CMP polishing pads from psiloQuest.
The W ProPad™ is the culmination of 5 years of development effort focused on achieving a consistent, novel pad technology that does not require external pad conditioning. Proven wafer-level benefits include low defectivity, low erosion, and excellent within-wafer non-uniformity using standard carrier designs. Substantial improvements are also realized in excellent overpolish margin, lower slurry consumption, and long pad life.
Dan Marks, President and CEO of psiloQuest, added, "We are thrilled to announce the launch of the first offering from the ProPad™ family of CMP pad products. Customer feedback continues to validate our approach of improving the technical performance of the polishing pad while simultaneously simplifying its use." The W ProPad™ is the commercial release designation of the beta-release product formerly ASP-3870. It is immediately available for most production rotational polisher configurations.
psiloQuest, Inc. was established in Orlando, FL during 2000 to develop and commercialize CMP polishing pads for the semiconductor industry. Initial product development and commercialization efforts took 2.5 years, and the company began commercial operations in April 2003. psiloQuest has distribution facilities in Korea, Taiwan, Singapore and Europe as well as distribution capabilities throughout North America.
For more information, contact psiloQuest at 888-CMP-PADS or Sales@psiloQuest.com
psiloQuest, Inc., Orlando